{"id":1393,"date":"2023-06-28T16:51:00","date_gmt":"2023-06-28T14:51:00","guid":{"rendered":"https:\/\/photonicsnl.dev.impression.nl\/?p=1393"},"modified":"2024-04-15T10:02:55","modified_gmt":"2024-04-15T08:02:55","slug":"imec-and-asml-sign-memorandum-of-understanding-mou-to-support-semiconductor-research-and-sustainable-innovation-in-europe","status":"publish","type":"post","link":"https:\/\/photonicsnl.dev.impression.nl\/nl\/imec-and-asml-sign-memorandum-of-understanding-mou-to-support-semiconductor-research-and-sustainable-innovation-in-europe\/","title":{"rendered":"imec and ASML sign Memorandum of Understanding (MOU) to support semiconductor research and sustainable innovation in Europe."},"content":{"rendered":"<p>imec, a leading research and innovation hub in nanoelectronics and digital technologies, and ASML Holding N.V. (ASML), a leading supplier to the semiconductor industry, today announce that they intend to intensify their collaboration in the next phase of developing a state-of-the-art high-numerical aperture (High-NA) extreme ultraviolet (EUV) lithography pilot line at imec.<\/p>","protected":false},"excerpt":{"rendered":"<p>imec, a leading research and innovation hub in nanoelectronics and digital technologies, and ASML Holding N.V. (ASML), a leading supplier to the semiconductor industry, today announce that they intend to intensify their collaboration in the next phase of developing a state-of-the-art high-numerical aperture (High-NA) extreme ultraviolet (EUV) lithography pilot line at imec.<\/p>","protected":false},"author":1,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[11],"tags":[],"class_list":["post-1393","post","type-post","status-publish","format-standard","hentry","category-general"],"jetpack_featured_media_url":"","_links":{"self":[{"href":"https:\/\/photonicsnl.dev.impression.nl\/nl\/wp-json\/wp\/v2\/posts\/1393","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/photonicsnl.dev.impression.nl\/nl\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/photonicsnl.dev.impression.nl\/nl\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/photonicsnl.dev.impression.nl\/nl\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/photonicsnl.dev.impression.nl\/nl\/wp-json\/wp\/v2\/comments?post=1393"}],"version-history":[{"count":1,"href":"https:\/\/photonicsnl.dev.impression.nl\/nl\/wp-json\/wp\/v2\/posts\/1393\/revisions"}],"predecessor-version":[{"id":1394,"href":"https:\/\/photonicsnl.dev.impression.nl\/nl\/wp-json\/wp\/v2\/posts\/1393\/revisions\/1394"}],"wp:attachment":[{"href":"https:\/\/photonicsnl.dev.impression.nl\/nl\/wp-json\/wp\/v2\/media?parent=1393"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/photonicsnl.dev.impression.nl\/nl\/wp-json\/wp\/v2\/categories?post=1393"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/photonicsnl.dev.impression.nl\/nl\/wp-json\/wp\/v2\/tags?post=1393"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}